Applied Materials, Inc. unveiled its new Applied Centura AdvantEdge Mesa system for creating nano-scale circuit features with angstrom-level precision in next-generation DRAM, Flash and Logic devices. As a result of this critical breakthrough in silicon etch technology, Applied has experienced very rapid demand for the AdvantEdge Mesa system. More than 60 chambers have shipped to customers in the last three months – where they are tool-of-record for 32nm chip production and 22nm development. ...